TY  - RPRT
TI  - Effects of ozone post deposition treatment on interfacial and electrical characteristics of atomic-layer-deposited Al2O3 and HfO2 films on GaSb substrates
AU  - Lianfeng Zhao
AU  - Zhen Tan
AU  - Jing Wang
AU  - Jun Xu
PY  - 2013
DO  - 10.1016/j.apsusc.2013.11.054
UR  - https://arxiv.org/abs/1310.6457
ID  - 1310.6457
ER  -