@misc{indiciae216f43be5f1f,
  title = {Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting},
  author = {Bei Yu and Jhih-Rong Gao and David Z. Pan},
  year = {2014},
  doi = {10.1117/12.2011355},
  url = {https://arxiv.org/abs/1402.2425},
  note = {Source identifier: 1402.2425}
}