@misc{indiciae83e821c92a41,
  title = {E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System},
  author = {Bei Yu and Kun Yuan and Jhih-Rong Gao and David Z. Pan},
  year = {2014},
  url = {https://arxiv.org/abs/1402.2435},
  note = {Source identifier: 1402.2435}
}