@misc{indiciae56f7442d3a5a,
  title = {Methodology for standard cell compliance and detailed placement for triple patterning lithography},
  author = {Bei Yu and Xiaoqing Xu and Jhih-Rong Gao and David Z. Pan},
  year = {2014},
  url = {https://arxiv.org/abs/1402.2635},
  note = {Source identifier: 1402.2635}
}