@misc{indiciaeef2ce19dd10c,
  title = {Integrating Atomic Layer Deposition and Ultra-High Vacuum Physical Vapor Deposition for In Situ Fabrication of Tunnel Junctions},
  author = {Alan J. Elliot and Gary A. Malek and Rongtao Lu and Siyuan Han and Haifeng Yiu and Shiping Zhao and Judy Z. Wu},
  year = {2014},
  doi = {10.1063/1.4890286},
  url = {https://arxiv.org/abs/1405.1069},
  note = {Source identifier: 1405.1069}
}