@misc{indiciae0ce2e6acf495,
  title = {Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session)},
  author = {Bei Yu and Subhendu Roy and Jhih-Rong Gao and David Z. Pan},
  year = {2014},
  url = {https://arxiv.org/abs/1408.0407},
  note = {Source identifier: 1408.0407}
}