@misc{indiciae56f1f45d8f56,
  title = {Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2},
  author = {Jinho Kim and Woochool Jang and Jingyu Park and Heeyoung Jeon and Hyunjung Kim and Junhan Yuh and Hyeongtag Jeon},
  year = {2014},
  doi = {10.3938/jkps.66.821},
  url = {https://arxiv.org/abs/1408.1252},
  note = {Source identifier: 1408.1252}
}