TY  - RPRT
TI  - Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
AU  - Jinho Kim
AU  - Woochool Jang
AU  - Jingyu Park
AU  - Heeyoung Jeon
AU  - Hyunjung Kim
AU  - Junhan Yuh
AU  - Hyeongtag Jeon
PY  - 2014
DO  - 10.3938/jkps.66.821
UR  - https://arxiv.org/abs/1408.1252
ID  - 1408.1252
ER  -