@misc{indiciae21801875ccfe,
  title = {Etching Mechanism of Niobium in Coaxial Ar/Cl2 RF Plasma},
  author = {J. Upadhyay and Do Im and S. Popović and A. -M. Valente-Feliciano and L. Phillips and L. Vušković},
  year = {2014},
  doi = {10.1063/1.4914298},
  url = {https://arxiv.org/abs/1411.0176},
  note = {Source identifier: 1411.0176}
}