@misc{indiciaea34b60b147ba,
  title = {Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes},
  author = {A Dolgov and O Yakushev and A Abrikosov and E Snegirev and V M Krivtsun and C J Lee and F Bijkerk},
  year = {2014},
  doi = {10.1088/0963-0252/24/3/035003},
  url = {https://arxiv.org/abs/1411.4505},
  note = {Source identifier: 1411.4505}
}