@misc{indiciae541b7e592564,
  title = {Optimum High-k Oxide for the Best Performance of Ultra-scaled Double-Gate MOSFETs},
  author = {Mehdi Salmani-Jelodar and Hesameddin Ilatikhameneh and SungGeun Kim and Kwok Ng and Gerhard Klimeck},
  year = {2015},
  doi = {10.1109/tnano.2016.2583411},
  url = {https://arxiv.org/abs/1502.06178},
  note = {Source identifier: 1502.06178}
}