TY  - RPRT
TI  - Optimum High-k Oxide for the Best Performance of Ultra-scaled Double-Gate MOSFETs
AU  - Mehdi Salmani-Jelodar
AU  - Hesameddin Ilatikhameneh
AU  - SungGeun Kim
AU  - Kwok Ng
AU  - Gerhard Klimeck
PY  - 2015
DO  - 10.1109/tnano.2016.2583411
UR  - https://arxiv.org/abs/1502.06178
ID  - 1502.06178
ER  -