@misc{indiciae71d26373672a,
  title = {Direct comparison of domain wall behavior in Permalloy nanowires patterned by electron beam lithography and focused ion beam milling},
  author = {M. A. Basith and S. McVitie and D. McGrouther and J. N. Chapman and J. M. R. Weaver},
  year = {2015},
  doi = {10.1063/1.3642966},
  url = {https://arxiv.org/abs/1508.01910},
  note = {Source identifier: 1508.01910}
}