TY  - RPRT
TI  - Direct comparison of domain wall behavior in Permalloy nanowires patterned by electron beam lithography and focused ion beam milling
AU  - M. A. Basith
AU  - S. McVitie
AU  - D. McGrouther
AU  - J. N. Chapman
AU  - J. M. R. Weaver
PY  - 2015
DO  - 10.1063/1.3642966
UR  - https://arxiv.org/abs/1508.01910
ID  - 1508.01910
ER  -