TY  - RPRT
TI  - Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride
AU  - T. Shimizu
AU  - M. Villamayor
AU  - D. Lundin
AU  - U. Helmersson
PY  - 2015
DO  - 10.1088/0022-3727/49/6/065202
UR  - https://arxiv.org/abs/1509.07002
ID  - 1509.07002
ER  -