@misc{indiciae80843cb97fb4,
  title = {Fine-tuning the etch depth profile via dynamic shielding of ion beam},
  author = {Lixiang Wu and Keqiang Qiu and Shaojun Fu},
  year = {2015},
  doi = {10.1016/j.nimb.2016.05.021},
  url = {https://arxiv.org/abs/1512.09237},
  note = {Source identifier: 1512.09237}
}