TY  - RPRT
TI  - Lower limits of line resistance in nanocrystalline Back End of Line Cu interconnects
AU  - Ganesh Hegde
AU  - R. Chris Bowen
AU  - Mark S. Rodder
PY  - 2016
DO  - 10.1063/1.4967196
UR  - https://arxiv.org/abs/1601.06675
ID  - 1601.06675
ER  -