@misc{indiciae067ae1958a46,
  title = {A Novel Analytic Approach to Model Line Edge Roughness using Stochastic Exposure Distribution in Electron-beam Lithography},
  author = {Rui Guo and Soo-Young Lee},
  year = {2015},
  url = {https://arxiv.org/abs/1604.05919},
  note = {Source identifier: 1604.05919}
}