TY  - RPRT
TI  - A Novel Analytic Approach to Model Line Edge Roughness using Stochastic Exposure Distribution in Electron-beam Lithography
AU  - Rui Guo
AU  - Soo-Young Lee
PY  - 2015
UR  - https://arxiv.org/abs/1604.05919
ID  - 1604.05919
ER  -