@misc{indiciaef21a9696dbe6,
  title = {A study on the growth mechanism and the process parameters controlling aluminum oxide thin films deposition by pulsed pressure MOCVD},
  author = {Hari Murthy and S. S Miya and Susan Krumdieck},
  year = {2016},
  url = {https://arxiv.org/abs/1608.05892},
  note = {Source identifier: 1608.05892}
}