TY  - RPRT
TI  - A study on the growth mechanism and the process parameters controlling aluminum oxide thin films deposition by pulsed pressure MOCVD
AU  - Hari Murthy
AU  - S. S Miya
AU  - Susan Krumdieck
PY  - 2016
UR  - https://arxiv.org/abs/1608.05892
ID  - 1608.05892
ER  -