@misc{indiciaede5aa61060d7,
  title = {CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature},
  author = {Arsenty Kaganskiy and Tobias Heuser and Ronny Schmidt and Sven Rodt and Stephan Reitzenstein},
  year = {2016},
  doi = {10.1116/1.4965883},
  url = {https://arxiv.org/abs/1611.07266},
  note = {Source identifier: 1611.07266}
}