TY  - RPRT
TI  - CSAR 62 as negative-tone resist for high-contrast e-beam lithography at temperatures between 4 K and room temperature
AU  - Arsenty Kaganskiy
AU  - Tobias Heuser
AU  - Ronny Schmidt
AU  - Sven Rodt
AU  - Stephan Reitzenstein
PY  - 2016
DO  - 10.1116/1.4965883
UR  - https://arxiv.org/abs/1611.07266
ID  - 1611.07266
ER  -