@misc{indiciae745e2e201921,
  title = {Ultra-high strain in epitaxial silicon carbide nanostructures utilizing residual stress amplification},
  author = {Hoang-Phuong Phan and Tuan-Khoa Nguyen and Toan Dinh and Ina Ginosuke and Atieh Ranjbar Kermany and Afzaal Qamar and Jisheng Han and Takahiro Namazu and Maeda Ryutaro and Dzung Viet Dao and Nam-Trung Nguyen},
  year = {2017},
  doi = {10.1063/1.4979834},
  url = {https://arxiv.org/abs/1701.02791},
  note = {Source identifier: 1701.02791}
}