@misc{indiciaea532e2b60b0f,
  title = {Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma},
  author = {Dorothee Hug and Simon Zihlmann and Mirko K. Rehmann and Yemliha B. Kalyoncu and Timothy N. Camenzind and Laurent Marot and Kenji Watanabe and Takashi Taniguchi and Dominik M. Zumbühl},
  year = {2017},
  doi = {10.1038/s41699-017-0021-7},
  url = {https://arxiv.org/abs/1703.04762},
  note = {Source identifier: 1703.04762}
}