TY  - RPRT
TI  - A comparative study of resists and lithographic tools using the Lumped Parameter Model
AU  - Roberto Fallica
AU  - Robert Kirchner
AU  - Dominique Mailly
AU  - Yasin Ekinci
PY  - 2017
DO  - 10.1116/1.4967183
UR  - https://arxiv.org/abs/1703.08229
ID  - 1703.08229
ER  -