@misc{indiciae33d946565b36,
  title = {Dielectric Engineering of HfO2 Gate Stacks Towards Normally-ON and Normally-OFF GaN HEMTs on Silicon},
  author = {Hareesh Chandrasekar and Sandeep Kumar and K. L. Ganapathi and Shreesha Prabhu and Surani Bin Dolmanan and Sudhiranjan Tripathy and Srinivasan Raghavan and K. N. Bhat and Sangeneni Mohan and R. Muralidharan and Navakanta Bhat and Digbijoy N. Nath},
  year = {2017},
  url = {https://arxiv.org/abs/1708.03811},
  note = {Source identifier: 1708.03811}
}