TY  - RPRT
TI  - Signature of growth-deposition technique on the properties of PECVD and thermal SiO2
AU  - Subimal Majee
AU  - Devesh Barshilia
AU  - Sanjeev Kumar
AU  - Prabhash Mishra
AU  - Jamil Akhtar
PY  - 2017
DO  - 10.1063/1.5047699
UR  - https://arxiv.org/abs/1709.03257
ID  - 1709.03257
ER  -