@misc{indiciae5769da8ca0c1,
  title = {Through-membrane electron-beam lithography for ultrathin membrane applications},
  author = {M. Neklyudova and A. K. Erdamar and L. Vicarelli and S. J. Heerema and T. Rehfeldt and G. Pandraud and Z. Kolahdouz and C. Dekker and H. W. Zandbergen},
  year = {2017},
  doi = {10.1063/1.4986991},
  url = {https://arxiv.org/abs/1709.04156},
  note = {Source identifier: 1709.04156}
}