@misc{indiciaedbf74a41e24a,
  title = {Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography},
  author = {Roberto Fallica and Dimitrios Kazazis and Robert Kirchner and Anja Voigt and Iacopo Mochi and Helmut Schift and Yasin Ekinci},
  year = {2017},
  doi = {10.1116/1.5003476},
  url = {https://arxiv.org/abs/1710.08733},
  note = {Source identifier: 1710.08733}
}