TY  - RPRT
TI  - Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
AU  - Roberto Fallica
AU  - Dimitrios Kazazis
AU  - Robert Kirchner
AU  - Anja Voigt
AU  - Iacopo Mochi
AU  - Helmut Schift
AU  - Yasin Ekinci
PY  - 2017
DO  - 10.1116/1.5003476
UR  - https://arxiv.org/abs/1710.08733
ID  - 1710.08733
ER  -