@misc{indiciae4d0931353399,
  title = {IP determination and 1+1 REMPI spectrum of SiO at 210-220 nm with implications for SiO\$\textasciicircum{}\{+\}\$ ion trap loading},
  author = {Patrick R. Stollenwerk and Ivan O. Antonov and Brian C. Odom},
  year = {2017},
  doi = {10.1016/j.jms.2018.11.008},
  url = {https://arxiv.org/abs/1710.08905},
  note = {Source identifier: 1710.08905}
}