@misc{indiciae2acc06b989dd,
  title = {Mask aligner for ultrahigh vacuum with capacitive distance control},
  author = {Priyamvada Bhaskar and Simon Mathioudakis and Tim Olschewski and Florian Muckel and Jan Raphael Bindel and Marco Pratzer and Marcus Liebmann and Markus Morgenstern},
  year = {2018},
  doi = {10.1063/1.5022462},
  url = {https://arxiv.org/abs/1801.02540},
  note = {Source identifier: 1801.02540}
}