@misc{indiciae9eae5cd44562,
  title = {Towards chemically neutral carbon cleaning processes: Plasma cleaning of Ni, Rh, and Al reflective optical coatings and thin Al filters for Free Electron Lasers and synchrotron beamline applications},
  author = {H. Moreno Fernández and M. Zangrando and G. Sauthier and A. R. Goñi and V. Carlino and E. Pellegrin},
  year = {2018},
  url = {https://arxiv.org/abs/1803.01675},
  note = {Source identifier: 1803.01675}
}