@misc{indiciae54d06d5b30b0,
  title = {Critical-point model dielectric function analysis of WO\$\_3\$ thin films deposited by atomic layer deposition techniques},
  author = {Ufuk Kilic and Derek Sekora and Alyssa Mock and Rafal Korlacki and Elena M. Echeverria and Natale J. Ianno and Eva Franke-Schubert and Mathias M. Schubert},
  year = {2018},
  doi = {10.1063/1.5038746},
  url = {https://arxiv.org/abs/1805.04171},
  note = {Source identifier: 1805.04171}
}