@misc{indiciaebf9fdb8ab1e2,
  title = {The development of low-temperature atomic layer deposition of HfO2 for TEM sample preparation on soft photo-resist substrate},
  author = {KP Peng and YC Liu and IF Lin and CC Lin and SW Huang and CC Ting},
  year = {2018},
  url = {https://arxiv.org/abs/1807.04510},
  note = {Source identifier: 1807.04510}
}