TY  - RPRT
TI  - The development of low-temperature atomic layer deposition of HfO2 for TEM sample preparation on soft photo-resist substrate
AU  - KP Peng
AU  - YC Liu
AU  - IF Lin
AU  - CC Lin
AU  - SW Huang
AU  - CC Ting
PY  - 2018
UR  - https://arxiv.org/abs/1807.04510
ID  - 1807.04510
ER  -