@misc{indiciaeacdaf4ecb308,
  title = {Overlay Accuracy Limitations of Soft Stamp UV Nanoimprint Lithography and Circumvention Strategies for Device Applications},
  author = {Piotr Jacek Cegielski and Jens Bolten and Jung Wuk Kim and Florian Schlachter and Christoph Nowak and Thorsten Wahlbrink and Anna Lena Giesecke and Max Christian Lemme},
  year = {2018},
  doi = {10.1016/j.mee.2018.06.004},
  url = {https://arxiv.org/abs/1808.01320},
  note = {Source identifier: 1808.01320}
}