@misc{indiciaea10b318ff717,
  title = {Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses},
  author = {Benedikt Rösner and Frieder Koch and Florian Döring and Jeroen Bosgra and Vitaliy A. Guzenko and Eugenie Kirk and Markus Meyer and Joshua L. Ornelas and Rainer H. Fink and Stefan Stanescu and Sufal Swaraj and Rachid Belkhou and Benjamin Watts and Jörg Raabe and Christian David},
  year = {2018},
  doi = {10.1016/j.mee.2018.01.033},
  url = {https://arxiv.org/abs/1809.07251},
  note = {Source identifier: 1809.07251}
}