@misc{indiciae205424cd4b87,
  title = {High aspect ratio silicon structures by Displacement Talbot lithography and Bosch etching},
  author = {Konstantins Jefimovs and Lucia Romano and Joan Vila-Comamala and Matias Kagias and Zhentian Wang and Li Wang and Christian Dais and Harun Solak and Marco Stampanoni},
  year = {2018},
  doi = {10.1117/12.2258007},
  url = {https://arxiv.org/abs/1810.13156},
  note = {Source identifier: 1810.13156}
}