@misc{indiciae9f0aafcb8179,
  title = {Atomic process of oxidative etching in monolayer molybdenum disulfide},
  author = {Danhui Lv and Hulian Wang and Dancheng Zhu and Jie Lin and Guoli Yin and Fang Lin and Ze Zhang and Chuanhong Jin},
  year = {2018},
  doi = {10.1016/j.scib.2017.05.016},
  url = {https://arxiv.org/abs/1811.04242},
  note = {Source identifier: 1811.04242}
}