@misc{indiciaea92c865fc0da,
  title = {Uniform vapor pressure based CVD growth of MoS2 using MoO3 thin film as a precursor for co-evaporation},
  author = {Sajeevi S. Withanage and Hirokjyoti Kalita and Hee-Suk Chung and Tania Roy and Yeonwoong Jung and Saiful I. Khondaker},
  year = {2019},
  doi = {10.1021/acsomega.8b02978},
  url = {https://arxiv.org/abs/1811.06119},
  note = {Source identifier: 1811.06119}
}