TY  - RPRT
TI  - Uniform vapor pressure based CVD growth of MoS2 using MoO3 thin film as a precursor for co-evaporation
AU  - Sajeevi S. Withanage
AU  - Hirokjyoti Kalita
AU  - Hee-Suk Chung
AU  - Tania Roy
AU  - Yeonwoong Jung
AU  - Saiful I. Khondaker
PY  - 2019
DO  - 10.1021/acsomega.8b02978
UR  - https://arxiv.org/abs/1811.06119
ID  - 1811.06119
ER  -