@misc{indiciae60ce56e3063b,
  title = {The role of ionization fraction on the surface roughness, density and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering and HiPIMS: An atomistic simulation},
  author = {Movaffaq Kateb and Hamidreza Hajihoseini and Jon Tomas Gudmundsson and Snorri Ingvarsson},
  year = {2019},
  url = {https://arxiv.org/abs/1904.08758},
  note = {Source identifier: 1904.08758}
}