@misc{indiciaeddb03e350319,
  title = {Properties of Al2O3 thin films deposited on 4H-SiC by reactive ion sputtering},
  author = {P. Fiorenza and M. Vivona and S. Di Franco and E. Smecca and S. Sanzaro and A. Alberti and M. Saggio and F. Roccaforte},
  year = {2019},
  doi = {10.1016/j.mssp.2019.01.017},
  url = {https://arxiv.org/abs/1906.03092},
  note = {Source identifier: 1906.03092}
}