@misc{indiciae53c853fa5856,
  title = {Bipolar High Power Impulse Magnetron Sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias},
  author = {Rommel Paulo B. Viloana and Jiabin Gub and Robert Boyda and Julien Keraudya and Liuhe Li and Ulf Helmersson},
  year = {2019},
  doi = {10.1016/j.tsf.2019.05.069},
  url = {https://arxiv.org/abs/1906.06074},
  note = {Source identifier: 1906.06074}
}