TY  - RPRT
TI  - Bipolar High Power Impulse Magnetron Sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias
AU  - Rommel Paulo B. Viloana
AU  - Jiabin Gub
AU  - Robert Boyda
AU  - Julien Keraudya
AU  - Liuhe Li
AU  - Ulf Helmersson
PY  - 2019
DO  - 10.1016/j.tsf.2019.05.069
UR  - https://arxiv.org/abs/1906.06074
ID  - 1906.06074
ER  -