@misc{indiciae7c534cf8ea92,
  title = {Niobium nitride thin films for very low temperature resistive thermometry},
  author = {Tuyen Nguyen and Adib Tavakoli and Sebastien Triqueneaux and Rahul Swami and Aki Ruhtinas and Jeremy Gradel and Pablo Garcia-Campos and Klaus Hasselbach and Aviad Frydman and Benjamin Piot and Mathieu Gibert and Eddy Collin and Olivier Bourgeois},
  year = {2019},
  doi = {10.1007/s10909-019-02222-6},
  url = {https://arxiv.org/abs/1907.08443},
  note = {Source identifier: 1907.08443}
}