TY  - RPRT
TI  - Direct Patterning of Boron-doped Amorphous Carbon Using Focused Ion Beam-assisted Chemical Vapor Deposition
AU  - Ryo Matsumoto
AU  - El Hadi S. Sadki
AU  - Hiromi Tanaka
AU  - Sayaka Yamamoto
AU  - Shintaro Adachi
AU  - Hiroyuki Takeya
AU  - Yoshihiko Takano
PY  - 2019
DO  - 10.1016/j.tsf.2021.138704
UR  - https://arxiv.org/abs/1908.09273
ID  - 1908.09273
ER  -