@misc{indiciae60ba8399a682,
  title = {Engineering Ferroelectric Hf0.5Zr0.5O2 Thin Films by Epitaxial Stress},
  author = {Saul Estandia and Nico Dix and Jaume Gazquez and Ignasi Fina and Jike Lyu and Matthew F. Chisholm and Josep Fontcuberta and Florencio Sanchez},
  year = {2019},
  doi = {10.1021/acsaelm.9b00256},
  url = {https://arxiv.org/abs/1909.01563},
  note = {Source identifier: 1909.01563}
}